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Proceedings Paper

Simple method for measuring acid generation quantum efficiency at 193 nm
Author(s): Charles R. Szmanda; Robert J. Kavanagh; John F. Bohland; James F. Cameron; Peter Trefonas III; Robert F. Blacksmith
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Paper Abstract

Traditional methods of measuring the Dill C Parameter involve monitoring the absorbance of a resist as a function of exposure. In chemically amplified resist, absorbance changes with exposure are small and frequently have little correlation to the amount of photoacid generated.

Paper Details

Date Published: 11 June 1999
PDF: 10 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350274
Show Author Affiliations
Charles R. Szmanda, Shipley Co. Inc. (United States)
Robert J. Kavanagh, Shipley Co. Inc. (United States)
John F. Bohland, Shipley Co. Inc. (United States)
James F. Cameron, Shipley Co. Inc. (United States)
Peter Trefonas III, Shipley Co. Inc. (United States)
Robert F. Blacksmith, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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