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Proceedings Paper

Evaluation of PAC performance in a thick film photoresist
Author(s): Kathryn H. Jensen; Stanley A. Ficner; Yvette M. Perez
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Paper Abstract

In this paper we evaluate the photoactive compound (PAC) performance in a thick film photoresist. In an effort to report the performance of a thick film photoresist and the correlation to PAC structure, we have studied several formulations containing a monofunctional PAC(A) in comparison to a polyfunctional (PAC(B). We have seen that the use of a monofunctional photoactive compound provides for a high performance thick film photoresist with good profile, depth of focus, resolution, and exposure latitude. A polyfunctional PAC however, causes a loss in performance. The ratio of monofunctional PAC(A) to polyfunctional PAC(B) was varied and lithography was studied on a Nikon stepper (i-line). In our study, we evaluate the effect of the addition of PAC(B) to our formulations and the consequences in terms of lithographic performance.

Paper Details

Date Published: 11 June 1999
PDF: 9 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350253
Show Author Affiliations
Kathryn H. Jensen, Clariant Corp. (United States)
Stanley A. Ficner, Clariant Corp. (United States)
Yvette M. Perez, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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