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Proceedings Paper

New photoresist stripper and a system for recycling it
Author(s): Hideki Nishida; Hiroshi Kikuchi; Kensuke Yano; Hiroyasu Matsuda
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Paper Abstract

Although it is hard to strip away the photoresist layer damaged during the etching process in manufacturing liquid crystal display devices, monoethynoloamine (MEA) was found to have excellent photoresist stripping characteristics. Crosslinked novolak resin is easily dissolved in a MEA solution because MEA has a large cohesive energy, a strong affinity for novolak, and a small molecular weight. Pure MEA can be recycled with high yield by using a simple system that has short multiple-pipe distillation columns that have high heat-transfer efficiency. The pipes in our distillation system are made of 304 stainless steel because this material was found to resist corrosion in an aqueous MEA solution better than 316L stainless or Cu. This recycling system has been operating in production lines for more than two years without showing any signs of trouble.

Paper Details

Date Published: 11 June 1999
PDF: 9 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350252
Show Author Affiliations
Hideki Nishida, Hitachi, Ltd. (Japan)
Hiroshi Kikuchi, Hitachi, Ltd. (Japan)
Kensuke Yano, Kimura Kakoki K.K. (Japan)
Hiroyasu Matsuda, Mitsui Chemical Industries, Inc. (Japan)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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