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Proceedings Paper

Design of a new bottom antireflective coating composition for KrF resist
Author(s): Kazuyoshi Mizutani; Makoto Momota; Toshiaki Aoai; Morio Yagihara
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Paper Abstract

A study for a new organic bottom antireflective coating (BARC) composition is described. A structural design of a light-absorbing dye was most important because dye structure not only plays a role in eliminating reflection from a substrate but also shows influence on dry etch rate of BARC material to a considerable extent. For example, an anthracene moiety with large absorption at 248 nm had undesirable dry etch resistance. 3-Hydroxy-2-naphthoic acid moiety was found to be one of suitable dyes for KrF BARC compositions, and the polymer bearing the dye showed enough absorbance and good erodability in dry etch. The BARC polymer was eroded as one and a half times faster than a novolak resin, and a little faster than an anthracene incorporated polymer. The result was discussed from the concepts of Ohnishi parameter and the ring parameter for dry etch durability of resist materials. BARC polymer should be thermoset by hard bake to eliminate intermixing with resist compositions. The BARC polymer bearing hydroxy group which is useful for a crosslinking reaction was thermoset in the presence of melamine-formaldehyde crosslinker and an acid catalyst after baking over 200 degrees C.

Paper Details

Date Published: 11 June 1999
PDF: 9 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350234
Show Author Affiliations
Kazuyoshi Mizutani, Fuji Photo Film Co., Ltd. (Japan)
Makoto Momota, Fuji Photo Film Co., Ltd. (Japan)
Toshiaki Aoai, Fuji Photo Film Co., Ltd. (Japan)
Morio Yagihara, Fuji Photo Film Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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