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Proceedings Paper

Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists
Author(s): Pushkara Rao Varanasi; Niranjan Patel
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Paper Abstract

In this paper, we present the synthesis, thermal properties, dissolution characteristics and lithographic potential of a new poly(hydroxystyrene) derivative (PHS-EtOH) obtained by blocking the phenolic functionality with a saturated alcohol moiety through an ether linkage. The replacement of PHS with this modified polymer in a negative resist formulation has resulted in a dramatic improvement in dense line resolution.

Paper Details

Date Published: 11 June 1999
PDF: 6 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350177
Show Author Affiliations
Pushkara Rao Varanasi, IBM Microelectronics Div. (United States)
Niranjan Patel, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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