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Proceedings Paper

Efficient simulation of postexposure bake processes in STORM
Author(s): Ebo H. Croffie; Mosong Cheng; Marco Antonio Zuniga; Andrew R. Neureuther
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Paper Abstract

An efficient software tool, STORM, is described for simulating 2D line-edge profiles and line-end shortening in chemically-amplified resist (CARs). The most difficult aspect of modeling CARs is emulating the amplification reaction and reaction state dependent transport. The difficulty arises primarily out of the nonlinearity associated with the behavior of diffusion with reacted materials state. These phenomena have important impacts in horizontal and vertical cross section profiles of post- exposure baked resists. They also impact line-ends which are three dimensional but may be approximated using the two horizontal dimensions.

Paper Details

Date Published: 11 June 1999
PDF: 8 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350174
Show Author Affiliations
Ebo H. Croffie, Univ. of California/Berkeley (United States)
Mosong Cheng, Univ. of California/Berkeley (United States)
Marco Antonio Zuniga, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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