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Proceedings Paper

Effect of cresol monomers in three-component novolak resin on photolithographic performance
Author(s): Woo-Kyu Kim; M. Dalil Rahman; Stanley A. Ficner; Dinesh N. Khanna
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Paper Abstract

In our previous publication we reported an improved process for isolation of novolak resins form phenol-formaldehyde condensation mixtures. The process results in resins having low polydispersity and slow photospeed. Novolak resins were prepared by the same process, employing different ratios of the cresol components. This paper will discuss an experimental design analyzing relationship between cresol component ratios and properties of the resins. The characteristics of the resins and their effect on the lithographic performances as an i-line photoresist composition will also be discussed.

Paper Details

Date Published: 11 June 1999
PDF: 8 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350171
Show Author Affiliations
Woo-Kyu Kim, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)
Stanley A. Ficner, Clariant Corp. (United States)
Dinesh N. Khanna, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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