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Proceedings Paper

Alternate novolak resin fractionation
Author(s): Michelle M. Cook; M. Dalil Rahman; Stan F. Wanat; Douglas S. McKenzie; Balaji Narasimhan; Robert K. Fea; Melodie I. Munoz
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Paper Abstract

Novolak resins fractionated using a unique method, were compared to resins fractionated with conventional methods. The potential for improving the fractionation/separation process and for making improved or more consistent resist with the resins was identified. Several experimental designs were run to determine optimum conditions needed to achieve better separation. Isolated resins were used to make experimental i-line photoresists which were tested against resists made with the conventional processes.

Paper Details

Date Published: 11 June 1999
PDF: 10 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350168
Show Author Affiliations
Michelle M. Cook, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)
Stan F. Wanat, Clariant Corp. (United States)
Douglas S. McKenzie, Clariant Corp. (United States)
Balaji Narasimhan, Rutgers Univ. (United States)
Robert K. Fea, Rutgers Univ. (United States)
Melodie I. Munoz, Rutgers Univ. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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