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Proceedings Paper

Process and performance optimization of bottom antireflective coatings: II
Author(s): Shuji Ding; John P. Sagan; Jianhui Shan; Eleazar Gonzalez; Sunit S. Dixit; Ying Liu; Dinesh N. Khanna
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Paper Abstract

The newly developed AZ BARLi II coating material is a photoresist solvent-based bottom antireflective coating (BARC) for i-line lithographic application. The coating material has good compatibility with common edge bead removal solvents such as ethyl lactate, PGME, or PGMEA mixed with ethyl lactate or PGME. To evaluate the BARC material, its chemical compatibility with common EBR solvents has been tested by several analytical techniques including liquid particle counts and surface defect studies. Both top and bottom EBR dispense processes have been investigated and optimized. Improvements on edge roughness, visual cleanliness, and the BARC coating buildup at the edge will be discussed in this paper.

Paper Details

Date Published: 11 June 1999
PDF: 11 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350152
Show Author Affiliations
Shuji Ding, Clariant Corp. (United States)
John P. Sagan, Clariant Corp. (United States)
Jianhui Shan, Clariant Corp. (United States)
Eleazar Gonzalez, Clariant Corp. (United States)
Sunit S. Dixit, Clariant Corp. (United States)
Ying Liu, Clariant Corp. (United States)
Dinesh N. Khanna, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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