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Proceedings Paper

Application of the grating, slit and edge image analysis in the inspiration of UV high-performance lenses
Author(s): Rolph Hey; Christian Hofmann; Jens-Ullrich Mueller
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Paper Abstract

In the process of evaluation the performance of photolithographical lenses it is necessary to determine the image intensity distribution of submicron-patterns in relation to aberrations and the light source. Our lens testing equipment, working with g-line systems4 , was adapted for the UV and DUV region.

Paper Details

Date Published: 1 July 1990
PDF: 1 pages
Proc. SPIE 1319, Optics in Complex Systems, (1 July 1990); doi: 10.1117/12.34903
Show Author Affiliations
Rolph Hey, Jenoptik Jena GmbH (Germany)
Christian Hofmann, Jenoptik Jena GmbH (Germany)
Jens-Ullrich Mueller, Jenoptik Jena GmbH (Germany)

Published in SPIE Proceedings Vol. 1319:
Optics in Complex Systems
F. Lanzl; H.-J. Preuss; G. Weigelt, Editor(s)

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