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Proceedings Paper

Investigation and application of the buried-layer van der Pauw and bar resistors
Author(s): Keith Findlater; Martin Fallon; Mark Redford
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Paper Abstract

Sheet resistance measurements are often used as process control monitors and are a key part of resistor measurements for SPICE models. These are normally Ohmic in nature. However it can be seen that buried layer resistors are strongly affected by the applied bias conditions in a similar mode to JFET operation. Two standard resistor structures have been studied to investigate this effect: the bar resistor and the van der Pauw, 2D and 3D-device simulation have been used to model the self-modulation and to produce recommendations for optimized routine measurement.

Paper Details

Date Published: 27 April 1999
PDF: 7 pages
Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); doi: 10.1117/12.346922
Show Author Affiliations
Keith Findlater, National Semiconductor Ltd. and Univ. of Edinburgh (United Kingdom)
Martin Fallon, National Semiconductor Ltd. (United Kingdom)
Mark Redford, National Semiconductor Ltd. (Singapore)

Published in SPIE Proceedings Vol. 3743:
In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing
Kostas Amberiadis; Gudrun Kissinger; Katsuya Okumura; Seshu Pabbisetty; Larg H. Weiland, Editor(s)

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