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Proceedings Paper

Enhanced microlithography using coherent multiple imaging
Author(s): Miklos Erdelyi; Karoly Osvay; Zsolt Bor; William L. Wilson Jr.; Michael C. Smayling; Frank K. Tittel
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Paper Abstract

An experimental and theoretical study of a coherent multiple imaging technique that utilizes a Fabry-Perot etalon placed between the photo mask and the projection lens is reported. This technique can enhance both resolution and depth of focus in optical microlithography. A lithography simulation tool, Prolith/2 was used to evaluate the aerial image profile using a complex phase-amplitude pupil-plane filter to simulate the effect of the Fabry-Perot etalon. This work specifically discusses the evaluation of extended periodic patterns, widely used in lithographic simulations. Simulation results are described and compared with experimental data. The impact of Talbot images generated by periodic structures is also described.

Paper Details

Date Published: 28 April 1999
PDF: 9 pages
Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); doi: 10.1117/12.346891
Show Author Affiliations
Miklos Erdelyi, JATE Univ. (Hungary)
Karoly Osvay, JATE Univ. (Hungary)
Zsolt Bor, JATE Univ. (Hungary)
William L. Wilson Jr., Rice Univ. (United States)
Michael C. Smayling, Rice Univ. (United States)
Frank K. Tittel, Rice Univ. (United States)

Published in SPIE Proceedings Vol. 3741:
Lithography for Semiconductor Manufacturing
Chris A. Mack; Tom Stevenson, Editor(s)

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