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Proceedings Paper

Characterization of porous silicon for solar cell application by atomic force microscopy
Author(s): I. Simkiene; Valentinas J. Snitka; Kestutis Naudzius; Vaidas Pacebutas; Mindaugas Rackaitis
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Paper Abstract

The anodically etched macroporous and nanoporous silicon layers (PS) were tested in order to determine their surface roughness dependence eon fabrication method. Porous silicon layers were obtained by electrochemical etching of n-type wafers, and then highly doped. Deep P+ layers were prepared by boron diffusion into the PS from spin-on glass glasses. The structure of PS surface of solar cells obtained was examined by atomic force microscopy. The system of PS coated with nanoporous PS as a antireflection coating exhibited a uniform macroarray of regular square and faceted large features of various sizes as a texturisated solar cell with average 1.43 micrometers high and computed roughness parameter Rz - 2.37 micrometers . For the same macroporous silicon sample without additional nanoporous silicon layer computed Rz was 4.84 micrometers . This could be explained by electropolishing of macroporous silicon surface. The obtained results confirm that AFM can be employed for the accurate measurement of the shape of macroporous silicon covered by the nanoporous silicon layer.

Paper Details

Date Published: 10 March 1999
PDF: 4 pages
Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341190
Show Author Affiliations
I. Simkiene, Semiconductor Physics Institute (Lithuania)
Valentinas J. Snitka, Kaunas Univ. of Technology (Lithuania)
Kestutis Naudzius, Semiconductor Physics Institute (Lithuania)
Vaidas Pacebutas, Semiconductor Physics Institute (Lithuania)
Mindaugas Rackaitis, Kaunas Univ. of Technology (Lithuania)

Published in SPIE Proceedings Vol. 3680:
Design, Test, and Microfabrication of MEMS and MOEMS
Bernard Courtois; Wolfgang Ehrfeld; Selden B. Crary; Wolfgang Ehrfeld; Hiroyuki Fujita; Jean Michel Karam; Karen W. Markus, Editor(s)

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