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Proceedings Paper

Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition
Author(s): Curtis T. Laush
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Paper Abstract

A system has been developed using extractive FTIR techniques to characterize the gaseous emissions from semiconductor wafer process tools. The system provides real-time data collection, processing and display for multiple compounds simultaneously. Tool effluent emission profiles that track concentrations are produced with time resolutions on the order of seconds. Along with a description of the hardware, sampling and analysis methods, the results of some field testing and system validations are also presented.

Paper Details

Date Published: 10 February 1999
PDF: 6 pages
Proc. SPIE 3534, Environmental Monitoring and Remediation Technologies, (10 February 1999); doi: 10.1117/12.339056
Show Author Affiliations
Curtis T. Laush, Radian International (United States)

Published in SPIE Proceedings Vol. 3534:
Environmental Monitoring and Remediation Technologies
Tuan Vo-Dinh; Robert L. Spellicy, Editor(s)

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