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Proceedings Paper

Electric discharge repetitively pulsed HF/DF chemical laser operating on the mixture F2 + H2 (D2)
Author(s): C. A. Kutumov; E. A. Klimuk; Georgiy A. Troshchinenko
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Paper Abstract

The HF/DF pulsed chemical lasers, operating on the unchain mixtures SF6 + H2 (D2), have rather low efficiency and relatively small number of lines in a radiation spectrum. The application fluorine-hydrogen (deuterium) mixtures allows to raise many times the specific energy characteristics of the laser and number of lines in a radiation spectrum, that potentially makes such a laser as a universal source of radiation in systems of an ecological and technological monitoring. For the specified applications the generation spectrum on molecules HF-DF covers a wavelength range of 2.6 - 5 micrometer of an absorption spectrum of many atmospheric pollution and technological products. However, for creation the HF/DF repetitively pulsed chemical laser (RPCL) it is necessary to solve a number of scientific and technical problems, therefore till now the mentions of an effective RPCL realization are absent. Highly effective HF/DF-RPCL with active volume 50 cm3 was developed and created. It is initiated by the barrier discharge and operates with the pulse repetition rate up to 50 Hz. In a mode of generation on a molecule HF its characteristics are investigated in detail: a technical efficiency -- up to 10% average power of radiation - - up to 6.5 W, number of the spectrum lines of 23.

Paper Details

Date Published: 22 December 1998
PDF: 5 pages
Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); doi: 10.1117/12.334496
Show Author Affiliations
C. A. Kutumov, Russian Scientific Ctr. of Applied Chemistry (Russia)
E. A. Klimuk, Russian Scientific Ctr. of Applied Chemistry (Russia)
Georgiy A. Troshchinenko, Russian Scientific Ctr. of Applied Chemistry (Russia)


Published in SPIE Proceedings Vol. 3574:
XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Anatoly S. Boreisho; Gennady A. Baranov, Editor(s)

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