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Proceedings Paper

The AIMS tool: its potentials, applications, and issues
Author(s): Syed A. Rizvi; Nathan A. Diachun
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Paper Abstract

The AIMS Tool, manufactured by the Zeiss of Jena, Germany, is a unique combination of sophisticated optics and ingenious software designed to simulate the image of mask pattern as it would be created by a stepper on its wafer plane. This paper reviews some of the machine' capabilities and potentials, and shows its role in complementing the state of the art metrology tools. Most importantly, the paper explores ways of enhancing the productivity and utilization of the tool by strong participation of the newly formed AIMS Tool User's Group.

Paper Details

Date Published: 18 December 1998
PDF: 4 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332851
Show Author Affiliations
Syed A. Rizvi, Photronics, Inc. (United States)
Nathan A. Diachun, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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