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Proceedings Paper

Phase controllability improvement for alternating phase shift mask
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Paper Abstract

An alternating phase shift masks can improve resolution and lithographic latitude. However, Alt-PSMs have not yet become practical because of difficulty in their tight phase and defect control. In this paper, we focused on how to control both phase uniformity and phase mean value of etched quartz shifters. We found that a material of a dry-etching tale (cover plate of work electrode) was strongly affected for phase uniformity. By choosing an adequate material, phase uniformity of 1.9% could be achieved. Micro-loading effect and loading effect degrade phase controllability. Loading effect was not observed in our etching conditions. But micro-loading effect was observed. Back exposure process was useful to prevent micro-loading effect. To improve mean value controllability, 2 step etching process was adopted. By using this method, mean value cold be controlled within plus or minus 2 degrees.

Paper Details

Date Published: 18 December 1998
PDF: 17 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332833
Show Author Affiliations
Masami Nara, Dai Nippon Printing Co., Ltd. (Japan)
Toshifumi Yokoyama, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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