This paper reports on recent developments on lamellar multilayer gratings fabricated by ions implantation. Comparative investigations between conventional etched multilayer grating and implanted ones are made and outline the potentialities of the original process of fabrication. In addition, simulations were carried for different types of Cu K(alpha) ₁ x-ray measurements by using a rigorous theory of diffraction recently revised. The quality of the fits obtained with this method easily applicable to the implanted multilayer grating appears as an essential tool in the improvement of x-ray diffractive optics fabrication processes.

Date Published: 6 November 1998
PDF: 12 pages
Proc. SPIE 3449, X-Ray Microfocusing: Applications and Techniques, (6 November 1998); doi: 10.1117/12.330347

Published in SPIE Proceedings Vol. 3449:
X-Ray Microfocusing: Applications and Techniques
Ian McNulty, Editor(s)