Proceedings Paper
Reticle defects on optical proximity correction features| Format | Member Price | Non-Member Price |
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Paper Abstract
A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspections algorithm and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.
Paper Details
Date Published: 1 September 1998
PDF: 9 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328858
Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)
PDF: 9 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328858
Show Author Affiliations
Larry S. Zurbrick, KLA-Tencor Corp. (United States)
Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)
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