Share Email Print

Proceedings Paper

Mask fabrication in the USA
Author(s): Franklin D. Kalk
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Profound changes are occurring in the US mask industry. Two factors contribute to these changes. First, due to the prohibitive cost of developing new mask technology, captive mask shops have been largely displaced by merchant suppliers. Second, the mask technology ramp has exceeded the SIA roadmap. As a result, merchant suppliers must build advanced masks and ship them cost-effectively and on time from multiple manufacturing sites to many customers. This paper discusses the US mask industry and its technology position in the worldwide mask infrastructure. Examples of recent US technology thrusts are presented.

Paper Details

Date Published: 1 September 1998
PDF: 6 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328850
Show Author Affiliations
Franklin D. Kalk, DuPont Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

© SPIE. Terms of Use
Back to Top