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Proceedings Paper

Performance of a chemically amplified positive resist for next-generation photomask fabrication
Author(s): Masa-aki Kurihara; Toshikazu Segawa; Daichi Okuno; Naoya Hayashi; Hisatake Sano
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Paper Abstract

A positive-tone, chemically amplified resist (CAR) has been evaluated in comparison with non-CARs in its applicability to fabrication of reticles to be used for 180-nm-rule devices. The evaluated CAR is found to have better performance than the non-CARs. It has high sensitivity and high contrast enough to be used with e-beam writing systems, and good dry-etch durability. Its characteristics when exposed with e-beam writing system with different acceleration voltages is studied. The CD linearity is maintain down to 400 nm for all patterns by adoption of a 50 kV e-beam system and a proximity effect correction. The resolution limit is 150 nm for lines-and-space pattern. The allowance of the baking conditions is examined and the use of a highly temperature-controllable hot-plate yields good CD uniformity. The influence of the ammonia concentration in the process environment of the post exposure delay stability is investigated. The CAR should be used under a concentration of ammonia less than ca. 5 ppb, which is obtainable by use of a chemical filter. In conclusion, it is demonstrated that the CAR meets our requirements for resist for 180-nm-rule reticle fabrication.

Paper Details

Date Published: 1 September 1998
PDF: 13 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328819
Show Author Affiliations
Masa-aki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Toshikazu Segawa, Dai Nippon Printing Co., Ltd. (Japan)
Daichi Okuno, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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