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Proceedings Paper

Development of a fast beam-blanking system
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Paper Abstract

In order to obtain a precise dose control for proximity effect correction, a fast beam blanking system has been developed which can make possible the fine control of the beam pulse width with precision of less than 1 nanosecond. The system consists of a high precision blanker driving circuit and a blanking structure suitable for fast operation. The blanker driving circuit controls the pulse width by selecting delay line logic with required delay. The pulse width control of less than 1 nanosecond and pulse rising time of less than 10 nanoseconds were achieved. A coaxial structure was adopted for the blanking structure. The simulation study has shown that a blanking structure with low reflectance in a few GHz range is achievable. The pulse passed through an experimental blanking structure without distortion in waveform.

Paper Details

Date Published: 1 September 1998
PDF: 7 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328808
Show Author Affiliations
Munehiro Ogasawara, Toshiba Corp. (Japan)
Hitoshi Sunaoshi, Toshiba Corp. (Japan)
Ryoji Yoshikawa, Toshiba Machine Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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