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Proceedings Paper

Logic device trend: impact on mask technology
Author(s): Chiang Y. Yang
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Paper Abstract

Semiconductor technology has moved in an accelerating pace. memory devices drive density and the main efforts are in cell architecture and contact shrink. Logic devices, on the other hand, drive performance and the emphases are on poly gate CD and interconnect efficiency. In this paper, logic device trends will be presented and their impact on mask making technology will be discussed. Challenges in mask blanks, poly CD control, large data file size, applications of resolution enhancement techniques will be covered. Recent market environment and its implication for mask/reticle cost consideration will also be presented. Finally challenges on a different dimension and scale in post-optical lithography mask making will be discussed.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998);
Show Author Affiliations
Chiang Y. Yang, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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