The control and localization of small volumes of aqueous solutions inside miniature reactors is a topic of growing significance. A simple control method relies on patterning regions of different wetability that define and guide the liquid spread within these systems. In this paper photolithographic photodeposition is demonstrated as a technique for texturing patterned surfaces. Hydrophobic surfaces are created by selectively photopolymerizing trifluorochloroethylene gas (C₂F₃Cl) through a quartz mask. Similarly, hydrophilic surfaces are created via acetylene (C₂H₂) photopolymerization. These surfaces are demonstrated to provide a simple and effective means of fluidic control and localization.

Date Published: 10 September 1998
PDF: 8 pages
Proc. SPIE 3515, Microfluidic Devices and Systems, (10 September 1998); doi: 10.1117/12.322075

Published in SPIE Proceedings Vol. 3515:
Microfluidic Devices and Systems
A. Bruno Frazier; Chong Hyuk Ahn, Editor(s)