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Proceedings Paper

Lithography optics: its present and future
Author(s): Koichi Matsumoto; Takashi Mori
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Paper Abstract

Firstly, various technical aspects of ArF optics are surveyed. At present, the ArF excimer laser is regarded as one of the most promising candidates as a next-generation light source for optical lithography. Discussions are ranging over some critical issues of ArF optics. The lifetime of ArF optics supposedly limited by the radiation compaction of silica glass is estimated in comparison with KrF optics. Availability of calcium fluoride (CaF2) is also discussed. As a designing issue, a comparative study is made about the optical configuration, dioptric or catadioptric. In the end, our resist-based performance is shown. Secondly, estimated are the future trend regarding minimum geometry and the optical parameters, such as numerical aperture and wavelength. For the estimation, simulations based on aerial images are performed, where in the resolution limit is defined as a minimum feature size which retains practical depth of focus. Pattern geometry is classified into two categories, which are dense lines and isolated lines. Available wavelengths are assumed to be KrF excimer laser ((λ =248 nm), ArF excimer laser (λ =193 nm) and F2 excimer laser (λ =157 nm). Based upon the simulation results, the resolution limit is estimated for each geometry and each wavelength.

Paper Details

Date Published: 21 September 1998
PDF: 7 pages
Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); doi: 10.1117/12.322039
Show Author Affiliations
Koichi Matsumoto, Nikon Corp. (Japan)
Takashi Mori, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 3482:
International Optical Design Conference 1998
Leo R. Gardner; Kevin P. Thompson, Editor(s)

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