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Proceedings Paper

Micromachined silicon diffraction gratings for infrared spectroscopy
Author(s): Daniel T. Jaffe; Luke D. Keller; Oleg A. Ershov
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Paper Abstract

Micromachined silicon gratings offer two great advantages to astronomical spectroscopy in the IR: (1) Photolithographic processing techniques permit the production of gratings with much larger groove constants than are possible with conventional wavelength coverage, despite the relatively small format of IR arrays. (2) One can use anisotropic etching to form gratings on dielectric wedges. By illuminating the grating through the dielectric, we can achieve higher spectral resolution for a given grating size or a smaller grating for a given desired resolution. We discuss the technical challenges involved in micromachining large grating grooves over large areas while holding positional accuracy to very tight tolerances. Manufacturing issues include material choices, surface preparation, and chemical and physical effects during processing. We also discuss our program for evaluation of the finished products, show result of measurements we have made on front-surface and immersion devices, and use these result to assess the potential of these devices for real-world astronomical applications.

Paper Details

Date Published: 21 August 1998
PDF: 12 pages
Proc. SPIE 3354, Infrared Astronomical Instrumentation, (21 August 1998); doi: 10.1117/12.317263
Show Author Affiliations
Daniel T. Jaffe, Univ. of Texas/Austin (United States)
Luke D. Keller, Univ. of Texas/Austin (United States)
Oleg A. Ershov, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 3354:
Infrared Astronomical Instrumentation
Albert M. Fowler, Editor(s)

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