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Proceedings Paper

Recent advances in increasing the thermal flow resistance of acetal derivatized polyhydroxystyrene deep-UV matrix resins
Author(s): Janet M. Kometani; Francis M. Houlihan; Allen G. Timko; Omkaram Nalamasu; Elsa Reichmanis; Sharon A. Heffner; Mary E. Galvin-Donoghue
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Paper Abstract

The incorporation of the acetoxy group (AC) increases the thermal flow resistance of acetal derivatized polyhydroxystyrene matrices (ADPHS) without compromising the desirable dissolution characteristics. Two methods of introducing acetoxy to ADPHS resins were developed: (1) An economical one pot synthesis was utilized to make tertiary polymer containing hydroxystyrene (HS), acetoxystyrene (ACS) and acetals of HS. (2) We exploited the unique blending properties of poly(HS/ACS) and poly(HS/acetal HS). Both approaches were evaluated lithographically at 248 nm. It was found that both the tertiary polymer and blending approaches resulted in resists materials with improved Tg while giving resolutions down to 0.20 micrometers for line and space pairs and 0.15 micrometers for isolated lines.

Paper Details

Date Published: 29 June 1998
PDF: 8 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312466
Show Author Affiliations
Janet M. Kometani, Lucent Technologies/Bell Labs. (United States)
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)
Allen G. Timko, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies/Bell Labs. (United States)
Sharon A. Heffner, Lucent Technologies/Bell Labs. (United States)
Mary E. Galvin-Donoghue, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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