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Proceedings Paper

193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids
Author(s): Francis M. Houlihan; Janet M. Kometani; Allen G. Timko; Richard S. Hutton; Raymond A. Cirelli; Elsa Reichmanis; Omkaram Nalamasu; Allen H. Gabor; Arturo N. Medina; John J. Biafore; Sydney G. Slater
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Paper Abstract

Single layer resists for 193 nm based upon resins derived from alternating copolymers of cycloolefins and maleic anhydride will be discussed. Our past work has examined the effect of polymer structure and composition, dissolution inhibitor structure and loading as well as the effect of the photoacid generator on the resist dissolution properties. In this paper, we will report upon on some of our recent investigations aimed at improving performance by use of a new class of photoreactive additives, photogenerators of aminosulfonic acids. One example of these, bis(t- butylphenyl)iodonium cyclamate, will be shown in our high activation 193 nm single layer resist system as being a useful photodecomposable base additive capable of limiting acid diffusion and alleviating post exposure bake delay effects. Finally, we will describe the utility of these materials in low activation energy (acetal based) resist systems.

Paper Details

Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312462
Show Author Affiliations
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)
Janet M. Kometani, Lucent Technologies/Bell Labs. (United States)
Allen G. Timko, Lucent Technologies/Bell Labs. (United States)
Richard S. Hutton, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)
Allen H. Gabor, Olin Microelectronic Materials, Inc. (United States)
Arturo N. Medina, Olin Microelectronic Materials, Inc. (United States)
John J. Biafore, Olin Microelectronic Materials, Inc. (United States)
Sydney G. Slater, Olin Microelectronic Materials, Inc. (United States)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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