Proceedings Paper
Photoresist performance evaluation of implant resist systems| Format | Member Price | Non-Member Price |
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Paper Abstract
Semiconductor manufacturers continue to look for better techniques to create salable devices. As with any other manufacturing entity, cost effectiveness without sacrificing quality is the key. In photolithographic manufacturing, the elements that drive the cost are raw materials, process time (throughput), and process complexity (number and iterations of process phases). The specific area being addressed by this paper is the implant layers of the semiconductor fabrication process.
Paper Details
Date Published: 29 June 1998
PDF: 23 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998);
Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)
PDF: 23 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998);
Show Author Affiliations
David C. Pritchard, LSI Logic Corp. (United States)
Warren Montgomery, LSI Logic Corp. (United States)
Warren Montgomery, LSI Logic Corp. (United States)
Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)
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