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Proceedings Paper

Advanced negative resists using novel aminoplast crosslinkers
Author(s): Ali Afzali-Kushaa; Jeffrey D. Gelorme; Laura L. Kosbar; Mark O. Neisser; W. Brunswold; Christopher Feild; Margaret C. Lawson; Pushkara Rao Varanasi
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Paper Abstract

Current negative tone resists based on poly(4- hydroxystyrene) and aminoplast crosslinkers suffer from the limited solubility of commercially available crosslinkers in the most common casting solvents. The aminoplast crosslinkers also increase the dissolution rate of the base resin in aqueous alkaline developer. The lithographic performance of these resists is often limited by microbridging at high resolution. In this paper, synthesis of a series of glycoluril based aminoplast crosslinkers is described and the lithographic performance of resist formulations incorporating such compounds is discussed.

Paper Details

Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312358
Show Author Affiliations
Ali Afzali-Kushaa, IBM Thomas J. Watson Research Ctr. (Iran)
Jeffrey D. Gelorme, IBM Thomas J. Watson Research Ctr. (United States)
Laura L. Kosbar, IBM Thomas J. Watson Research Ctr. (United States)
Mark O. Neisser, IBM Microelectronics Div. (United States)
W. Brunswold, IBM Microelectronics Div. (United States)
Christopher Feild, IBM Microelectronics Div. (United States)
Margaret C. Lawson, IBM Microelectronics Div. (United States)
Pushkara Rao Varanasi, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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