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Proceedings Paper

Effects of structural differences in speed enhancers (dissolution promoters) on positive photoresist composition
Author(s): Michelle M. Cook; M. Dalil Rahman; Ping-Hung Lu
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Paper Abstract

Several low molecular weight polyhydroxy phenolic compounds were used to study their effect on DNQ novolak photoresist compositions. These compounds used with fractionated novolak resins in a positive photoresist composition, tend to improve the photospeed, but in some cases degrades the other characteristics of the resist including resolution and depth of focus. Improvements in performance (photospeed, sidewall angle, resolution, and depth of focus) may depend on the structure of the speed enhancer. Speed enhancers were obtained commercially or synthesized, characterized by HPLC and NMR, and were formulated as i-line resists. The goal of these studies was to find out the relationship between the structure of the speed enhancer and the performance of the resist.

Paper Details

Date Published: 29 June 1998
PDF: 9 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312346
Show Author Affiliations
Michelle M. Cook, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)
Ping-Hung Lu, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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