Proceedings Paper
Three-dimensional mask transmission simulation using a single integral equation method| Format | Member Price | Non-Member Price |
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Paper Abstract
A single integral equation formulation for electromagnetic scattering from three-dimensional dielectric objects is discussed. The new formulation converges significantly faster than the traditional, coupled integral equation formulation. The new formulation is extended to incorporate the exact boundary conditions for isolated mask features by using dyadic Green's functions for the stratified medium background. Results of three-dimensional phase-shifting mask simulation are presented.
Paper Details
Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310803
Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)
PDF: 10 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310803
Show Author Affiliations
Michael S. Yeung, Boston Univ. (United States)
Eytan Barouch, Boston Univ. (United States)
Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)
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