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Proceedings Paper

Performance of an i-line step-and-scan system for sub-0.25-um mix-and-match applications
Author(s): Peter van Oorschot; Bert Koek; Jeroen van der Spek; Eric Stuiver; Hans Franken; Herman Botter; Reiner B. Garreis
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Paper Abstract

Step & Scan technology will be used for the next generation of semiconductor lithography tools. This technology has matured over the last year, and results from several DUV tools have been reported. For economical mass production in sub 0.25 micrometer applications, DUV and i-line lithography have to be combined (mix and match). This paper reports on the performance of a new high throughput, high resolution i-line Step & Scan system. The system has a 0.65 NA, 4X projection lens which, together with the AERIALTM illuminator, provides a resolution of at least 0.28 micrometer. The identical field sizes and the Step & Scan principle, result in a matched machine overlay, which is comparable to matching only DUV Step & Scan systems.

Paper Details

Date Published: 29 June 1998
PDF: 14 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310771
Show Author Affiliations
Peter van Oorschot, ASM Lithography BV (Netherlands)
Bert Koek, ASM Lithography BV (Netherlands)
Jeroen van der Spek, ASM Lithography BV (Netherlands)
Eric Stuiver, ASM Lithography BV (Netherlands)
Hans Franken, ASM Lithography BV (Netherlands)
Herman Botter, ASM Lithography BV (Netherlands)
Reiner B. Garreis, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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