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Proceedings Paper

LAVA: lithography analysis using virtual access
Author(s): Chang Hsu; Rona Yang; Jeffery Cheng; Peter Chien; Victor Wen; Andrew R. Neureuther
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Paper Abstract

A web site allowing remote operation of the SPLAT, SAMPLE, TEMPEST and SIMPL simulators has been developed to promote collaborative work on lithography and in particular on EUV technology. Based on the extensive use of platform independent programming languages, LAVA is accessible from all modern computing platforms. The software supporting the web site is available to others in creating similar web site sites and in making simulators such as those from other universities 'play' together. The web site explores new paradigms in remote operation of lithography simulators and introduces more application-oriented modes of interaction with technologists. The LAVA web site URL is

Paper Details

Date Published: 29 June 1998
PDF: 5 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310748
Show Author Affiliations
Chang Hsu, Univ. of California/Berkeley (United States)
Rona Yang, Univ. of California/Berkeley (United States)
Jeffery Cheng, Univ. of California/Berkeley (United States)
Peter Chien, Univ. of California/Berkeley (United States)
Victor Wen, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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