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Proceedings Paper

New variable-transmission illumination technique optimized with design rule criteria
Author(s): Raymond A. Cirelli; Masis M. Mkrtchyan; Pat G. Watson; Lee E. Trimble; Gary R. Weber; David L. Windt; Omkaram Nalamasu
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Paper Abstract

We report on a novel technique for tuning the illumination of a lithography tool through the use of variable transmission apertures. In conjunction with this illumination technique, we have developed simulation software capable of identifying the optimum source plane coherence and intensity distribution to increase process latitude. This 'system' approach is capable of analyzing features specific to a given device level, or selected subsets of structure types within a given level. The fabrication of the aperture involves selectively depositing (alpha) -C onto a quartz plate that is inserted into the illuminator. Experimental testing has shown this film to be stable in its optical properties with extended exposure to DUV light. A description of the simulation software, aperture fabrication techniques, materials used, and experimental results for several aperture configurations are reported.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310739
Show Author Affiliations
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Masis M. Mkrtchyan, Lucent Technologies/Bell Labs. (United States)
Pat G. Watson, Lucent Technologies/Bell Labs. (United States)
Lee E. Trimble, Lucent Technologies/Bell Labs. (United States)
Gary R. Weber, Lucent Technologies/Bell Labs. (United States)
David L. Windt, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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