
Proceedings Paper
Magnetorheological-suspension-based finishing technologyFormat | Member Price | Non-Member Price |
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Paper Abstract
In magnetorheological finishing (MRF) the mechanical energy for material removal is generated by the hydrodynamic flow of a magnetorheological (MR) polishing suspension through a converging gap that is formed by a workpiece surface and a moving rigid wall. In addition to causing material removal, MRF also reduces the surface micro roughness of optical materials to ≤ 10 Å rms. Shape errors are corrected to a fraction of a wavelength of light and subsurface damage is removed. A theoretical analysis of MRF, based on Bingham lubrication theory, illustrates that the formation of a core attached to the moving wall results in dramatically high stress on the workpiece surface. A correlation between the shear stress on the workpiece surface and materials removal is obtained.
Paper Details
Date Published: 16 June 1998
PDF: 9 pages
Proc. SPIE 3326, Smart Structures and Materials 1998: Industrial and Commercial Applications of Smart Structures Technologies, (16 June 1998); doi: 10.1117/12.310670
Published in SPIE Proceedings Vol. 3326:
Smart Structures and Materials 1998: Industrial and Commercial Applications of Smart Structures Technologies
Janet M. Sater, Editor(s)
PDF: 9 pages
Proc. SPIE 3326, Smart Structures and Materials 1998: Industrial and Commercial Applications of Smart Structures Technologies, (16 June 1998); doi: 10.1117/12.310670
Show Author Affiliations
William I. Kordonski, QED Technologies (United States)
Donald Golini, QED Technologies (United States)
Paul Dumas, QED Technologies (United States)
Donald Golini, QED Technologies (United States)
Paul Dumas, QED Technologies (United States)
Stephen J. Hogan, QED Technologies (United States)
Stephen D. Jacobs, Univ. of Rochester (United States)
Stephen D. Jacobs, Univ. of Rochester (United States)
Published in SPIE Proceedings Vol. 3326:
Smart Structures and Materials 1998: Industrial and Commercial Applications of Smart Structures Technologies
Janet M. Sater, Editor(s)
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