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Proceedings Paper

Technological aspects of deep proton lithography for the fabrication of micro-optical elements for photonics in computing applications
Author(s): Patrik Tuteleers; Pedro Vynck; Heidi Ottevaere; Valerie Baukens; Guy Verschaffelt; Stefan Kufner; Maria Kufner; Alex Hermanne; Irina P. Veretennicoff; Hugo Thienpont
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Paper Abstract

The technology of deep proton lithography in PMMA (poly methyl methacrylate) is a fabrication method for monolithic integrated refractive micro-optical elements and micro-mechanical holder structures, which allows structural depths in the order of several hundred microns[l.21. Different optical functions can he fabricated in one block and form monolithic integrated optical systems. In addition mechanical support structures and alignment features can he integrated with these optical systems. This paper will focus mainly on the technological requirements of the irradiation, development and diffusion setups. which are necessary to achieve predictable and reproducible results with deep proton lithography.

Paper Details

Date Published: 22 May 1998
PDF: 3 pages
Proc. SPIE 3490, Optics in Computing '98, (22 May 1998); doi: 10.1117/12.308977
Show Author Affiliations
Patrik Tuteleers, Vrije Univ. Brussel (Belgium)
Pedro Vynck, Vrije Univ. Brussel (Belgium)
Heidi Ottevaere, Vrije Univ. Brussel (Belgium)
Valerie Baukens, Vrije Univ. Brussel (Belgium)
Guy Verschaffelt, Vrije Univ. Brussel (Belgium)
Stefan Kufner, Vrije Univ. Brussel (Belgium)
Maria Kufner, Vrije Univ. Brussel (Belgium)
Alex Hermanne, Eenheid Cyclotron (Belgium)
Irina P. Veretennicoff, Vrije Univ. Brussel (Belgium)
Hugo Thienpont, Vrije Univ. Brussel (Belgium)

Published in SPIE Proceedings Vol. 3490:
Optics in Computing '98
Pierre H. Chavel; David A. B. Miller; Hugo Thienpont, Editor(s)

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