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Proceedings Paper

Tin oxide pattern deposition by laser direct writing
Author(s): Tamas Szoerenyi; Zsolt Geretovszky; L. Kelemen; Jazsef Toth; Alen Simon
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Paper Abstract

Tin oxide pattern generation by laser deposition from SnCl4(DOT)5H2O in isopropanol is reported. Smooth, even stripes of thicknesses ranging from 20 to 120 nm with sharp, well defined edges and cross-section are deposited by scanning an Ar+ laser beam ((lambda) equals 514.5 nm) focused onto the substrate--solution interface with a constant speed of 1 mm/s. The linewidth linearly increases from 26 to 42 micrometers with increasing the power from 40 to 120 mW. The reproducibility of pattern generation is extremely good as revealed by scanning electron microscopy, energy dispersive X-ray and micro-area Rutherford backscattering analyses. The minimum DC resistivity of 1.7(DOT)10-2 (Omega) cm, measured without any process optimization, favorably compares with those reported for films prepared by other techniques. The chemical composition of the film material in SnOx with 1.1 < x < 1.5 as determined by X-ray photoelectron spectroscopy.

Paper Details

Date Published: 26 May 1998
PDF: 5 pages
Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); doi: 10.1117/12.308612
Show Author Affiliations
Tamas Szoerenyi, Research Group on Laser Physics (Hungary)
Zsolt Geretovszky, Research Group on Laser Physics (Hungary)
L. Kelemen, Research Group on Laser Physics (Hungary)
Jazsef Toth, Institute of Nuclear Research ATOMKI (Hungary)
Alen Simon, Institute of Nuclear Research ATOMKI (United States)

Published in SPIE Proceedings Vol. 3404:
ALT'97 International Conference on Laser Surface Processing
Vladimir I. Pustovoy, Editor(s)

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