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Proceedings Paper

Near-field optical tools to read, write, and copy information at the 100- to 10-nm scale
Author(s): U. C. Fischer; A. P. Naber; T. Dziomba; J. Koglin; W. Goehde; O. Panzer; Harald Fuchs
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Paper Abstract

Contact imaging by energy transfer was the first application of the optical near-field for imaging beyond the diffraction limit. It is a method by which surface nanostructures can be copied onto a monomolecular layer of a dye. Near field microscopy using tapered metal coated fibers with an aperture at their tip as a submicron source of light can be used as a tool to write structures at a resolution of 80 nm. These near-field optical methods are well suited to create-- by local photochemical reactions--patterns of locally differing chemical composition and reactivity. Such structures serve as matrices for a site selective binding of colloidal particles. Unlike other methods, light microscopy and near-field microscopy have a sensitivity to detect photochemical processes at the single molecular level. Near- field microscopy is not limited to a resolution of 50 nm. As recently shown, the resolution can be extended to the 1 - 10 nm range using the tetrahedral tip as a probe. We expect, that a convergence of these recent developments should result in a very powerful near-field optical toolbox to read, write and copy information at the 10 nm scale.

Paper Details

Date Published: 30 April 1998
PDF: 5 pages
Proc. SPIE 3272, Laser Techniques for Surface Science III, (30 April 1998); doi: 10.1117/12.307133
Show Author Affiliations
U. C. Fischer, Westfaelische Wilhelms-Univ. Muenster (Germany)
A. P. Naber, Westfaelische Wilhelms-Univ. Muenster (Netherlands)
T. Dziomba, Westfaelische Wilhelms-Univ. Muenster (Germany)
J. Koglin, Westfaelische Wilhelms-Univ. Muenster (Germany)
W. Goehde, Westfaelische Wilhelms-Univ. Muenster (Germany)
O. Panzer, Westfaelische Wilhelms-Univ. Muenster (Germany)
Harald Fuchs, Westfaelische Wilhelms-Univ. Muenster (Germany)

Published in SPIE Proceedings Vol. 3272:
Laser Techniques for Surface Science III
Hai-Lung Dai; Hans-Joachim Freund, Editor(s)

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