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Proceedings Paper

Design and fabrication of optical MEMS using a four-level planarized surface-micromachined polycrystalline silicon process
Author(s): M. Adrian Michalicek; John H. Comtois; Heather K. Schriner
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Paper Abstract

This paper describes the design and fabrication of optical microelectromechanical systems devices using the Sandia Ultra-planar Multi-level MEMS Technology fabrication process. This state-of-the-art process, offered by Sandia National Laboratories, provides unique and very advantageous features which make it ideal for optical devices such as micromirrors. This enabling process permits the development of micromirror devices with near-ideal characteristics which have previously been unrealizable in standard polysilicon processes. This paper describes many of these characteristics such as elevated address electrodes, various address wiring techniques, planarized mirror surfaces using Chemical Mechanical Polishing, unique post-process metallization, and the best active surface area to date.

Paper Details

Date Published: 15 March 1998
PDF: 8 pages
Proc. SPIE 3276, Miniaturized Systems with Micro-Optics and Micromechanics III, (15 March 1998); doi: 10.1117/12.302408
Show Author Affiliations
M. Adrian Michalicek, Air Force Research Lab. (United States)
John H. Comtois, Air Force Research Lab. (United States)
Heather K. Schriner, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 3276:
Miniaturized Systems with Micro-Optics and Micromechanics III
M. Edward Motamedi; Rolf Goering, Editor(s)

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