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Proceedings Paper

Analysis of defect classification and sizing information with a dedicated white-light/laser-confocal microscope review station
Author(s): James Xu; Kent Norton; Bruce Worster; Cecelia Du; Gary Lum; Marc E. Allard
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Paper Abstract

An integrated white light and laser confocal microscope system for photomask defect review and analysis is presented. Various sized NIST traceable latex spheres a well as defects on an industry standard VERIMASK are used to calibrate and characterize the performance of the system. It is demonstrated that the laser confocal microscope is capable of measuring features as small as 0.2 micrometer in size while the limit for the white light microscope is approximately 0.5 micrometer. Applications of the extended XY resolution and the sub-one-tenth micron depth sensitivity of the laser confocal microscope in defect classification and repair monitoring are explored and illustrated with examples taken from 6-inch conventional and phase-shift photomasks.

Paper Details

Date Published: 12 February 1997
PDF: 11 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301225
Show Author Affiliations
James Xu, Ultrapointe Corp. (United States)
Kent Norton, Ultrapointe Corp. (United States)
Bruce Worster, Ultrapointe Corp. (United States)
Cecelia Du, Ultrapointe Corp. (United States)
Gary Lum, Ultrapointe Corp. (United States)
Marc E. Allard, Ultrapointe Corp. (United States)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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