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Proceedings Paper

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology
Author(s): Mark L. Raphaelian; Don Carolan; J. David Casey Jr.; Andrew F. Doyle; M. F. Ellis; David C. Ferranti; Joshua Lessing; K. Rose; Diane K. Stewart; Roy L. White
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Paper Abstract

On the standard Micrion 8000 PM Repair System platform, the repair accuracy for clear defect repair and opaque defect repair is plus or minus 75 nm. Incorporation of a new ion beam column has pushed the repair accuracy for clear and opaque defect repairs to smaller values. This new system can image isolated defects less than 200 nm in size. To characterize the repair accuracy of the system, experiments on edge placement accuracy were performed. This paper presents data on the accuracy of defect repairs using the Micrion 8000 PSM Repair System on Chrome masks. The study specifically looks at the edge placement of opaque defect and clear defect repairs on masks coated with a conductive layer versus masks not coated with a conductive layer. We also explore the edge placement accuracy of the repair due to the directionality of the repair scan. Finally we examine the shape of the distribution function of the repair measurements and also investigate differences in the measured edge placement accuracy of repairs using different measuring techniques.

Paper Details

Date Published: 12 February 1997
PDF: 16 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301220
Show Author Affiliations
Mark L. Raphaelian, Micrion Corp. (United States)
Don Carolan, Micrion Corp. (United States)
J. David Casey Jr., Micrion Corp. (United States)
Andrew F. Doyle, Micrion Corp. (United States)
M. F. Ellis, Micrion Corp. (United States)
David C. Ferranti, Micrion Corp. (United States)
Joshua Lessing, Micrion Corp. (United States)
K. Rose, Micrion Corp. (United States)
Diane K. Stewart, Micrion Corp. (United States)
Roy L. White, SEMATECH, Intel Corp., and MIT Lincoln Labs. (United States)


Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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