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Proceedings Paper

Detection of submicron phase defects on multiphase random logic reticles
Author(s): Chris A. Spence; John L. Nistler; William H. Arnold; David Emery; Larry S. Zurbrick; Durai P. Prakash; X. Chang; Steve Khanna; Brent D. Leback; Eiji Tsujimoto; Greg P. Hughes
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Paper Abstract

In this paper we present results of an algorithm that has been developed which is sensitive to phase defects of 60 degrees on i-line alternating PSMs. This algorithm consists of microcode and software which can be loaded into existing inspection hardware. The algorithm works in die-to-die inspection mode and uses both transmitted and reflected light images to maximize sensitivity. Isolated phase defects missing and misaligned shifter edges. A programmed phase defect test plate was developed to characterize defect detection sensitivity. Detection of 60 degree defects smaller than 0.75 micrometer has been demonstrated with this algorithm. Defect sensitivity characterization and actual production plate defect results are shown.

Paper Details

Date Published: 12 February 1997
PDF: 15 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301195
Show Author Affiliations
Chris A. Spence, Advanced Micro Devices, Inc. (United States)
John L. Nistler, Advanced Micro Devices, Inc. (United States)
William H. Arnold, Advanced Micro Devices, Inc. (United States)
David Emery, KLA-Tencor Corp. (United States)
Larry S. Zurbrick, KLA-Tencor Corp. (United States)
Durai P. Prakash, KLA-Tencor Corp. (United States)
X. Chang, KLA-Tencor Corp. (United States)
Steve Khanna, KLA-Tencor Corp. (United States)
Brent D. Leback, KLA-Tencor Corp. (United States)
Eiji Tsujimoto, KLA-Tencor Corp. (United States)
Greg P. Hughes, DuPont Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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