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Proceedings Paper

Electron-beam lithography simulation for mask making: I
Author(s): Chris A. Mack
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Paper Abstract

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a simulated three-dimensional resist pattern.

Paper Details

Date Published: 12 February 1997
PDF: 12 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301194
Show Author Affiliations
Chris A. Mack, FINLE Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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