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Proceedings Paper

Integration of KLA Starlight for phase-shift mask manufacturing
Author(s): Denis M. Rigaill
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Paper Abstract

In the chrome-on-glass photomask inspection arena, KLA Starlight tool is mostly used in manufacturing mode as a particle detector and final plate quality verification, before mounting the pellicle, after pelliclization or both. When it applies to phase-shift reticles -- embedded attenuated as well as PhaseEdge --, there are other applications of Starlight defect detectivity, in addition to the above. This paper describes uses of Starlight technology at several process steps of PSM manufacturing. It addresses case of I-line and DUV Cr/MoSi embedded attenuated and multiple level quartz- etched alternating. Illustrations provided show several typical defect. Finally challenge to migrate from a development use into a full manufacturing integration is discussed. Based on Starlight performance, the price to pay to extend use of initially binary chrome-on-glass tool designed for production of phase-shift reticles is seized.

Paper Details

Date Published: 12 February 1997
PDF: 10 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301184
Show Author Affiliations
Denis M. Rigaill, IBM France and IBM Burlington (United States)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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