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Proceedings Paper

Advanced electron-beam pattern generation technology for 180-nm masks
Author(s): Frank E. Abboud; Charles A. Sauer; William Wang; Matthew Vernon; Richard Prior; Henry Thomas Pearce-Percy; Damon M. Cole; Marian Mankos
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Paper Abstract

Optical lithography will be the dominant technique used for 180 nm generation production devices. With a reduced feature size on the wafer, 4X optical reduction, optical proximity correction (OPC), and phase shift lithography techniques, mask-related errors become even more critical to wafer yield. In addition, small feature sizes and lithography enhancement techniques require finer edge resolution. Clearly, new patten generation tools are needed for this generation of maskmaking requirements. Multipass gray (MPG) writing strategy was introduced with the MEBESR 4500S. The ability to deliver a 4X improvement in dose while improving throughput is a significant advantage over previous MEBES systems. Since MPG is used in conjunction with offset scan voting, reduction in butting of over 50% has been demonstrated with MPG. Higher doses are now possible with use of a multipass writing strategy and a brighter source. As a result, resists with higher contrast and process robustness can be used. A significant improvement in uniformity is noted with the new process, an essential step needed in meeting 180 nm requirements. Dry etch is essential to meet these new requirements and with sufficient process margin to be manufacturable. This paper describes the key electron-beam pattern generation technology necessary to meet the requirement of 180 nm masks, including a high dose field- emission gun and column capable of delivering 800 A/cm2; complete dynamic beam correction; a digital stage servo to provide stable, reproducible stage control under high acceleration conditions; a high speed data path to support 320 MHz beam blanking and a 10 nm data address. This paper also examines the improvements made to the MEBES platform and documents the resulting improvements and compares these results to the requirements for 180 nm masks.

Paper Details

Date Published: 12 February 1997
PDF: 9 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301178
Show Author Affiliations
Frank E. Abboud, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)
William Wang, Etec Systems, Inc. (United States)
Matthew Vernon, Etec Systems, Inc. (United States)
Richard Prior, Etec Systems, Inc. (United States)
Henry Thomas Pearce-Percy, Etec Systems, Inc. (United States)
Damon M. Cole, Etec Systems, Inc. (United States)
Marian Mankos, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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