Proceedings Paper
Microstructural observation of short-wavelength recorded spots of phase-change thin film by atomic force microscopy| Format | Member Price | Non-Member Price |
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Paper Abstract
GeSb2Te4 phase change thin film was prepared by rf- magnetron sputtering method. Atomic force microscopy (AFM) was used to study the micro-structure of short-wavelength recorded spots. Microarea morphology images show that the recorded domain bulge after laser irradiation. With the increasing of writing pulse width, depression appears in the center of recorded spot. It is demonstrated that AFM is a very useful tool to evaluate the recorded spots and improve the performance of phase change media.
Paper Details
Date Published: 20 February 1998
PDF: 7 pages
Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); doi: 10.1117/12.300714
Published in SPIE Proceedings Vol. 3175:
Third International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)
PDF: 7 pages
Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); doi: 10.1117/12.300714
Show Author Affiliations
Liqiu Q. Men, Shanghai Institute of Optics and Fine Mechanics (China)
Huiyong Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Fusong S. Jiang, Shanghai Institute of Optics and Fine Mechanics (China)
Huiyong Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Fusong S. Jiang, Shanghai Institute of Optics and Fine Mechanics (China)
Fuxi Gan, Shanghai Institute of Optics and Fine Mechanics (China)
Jielin Sun, Shanghai Institute of Nuclear Research (China)
Minqian Li, Shanghai Institute of Nuclear Research (China)
Jielin Sun, Shanghai Institute of Nuclear Research (China)
Minqian Li, Shanghai Institute of Nuclear Research (China)
Published in SPIE Proceedings Vol. 3175:
Third International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)
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