Share Email Print

Proceedings Paper

Advanced pulsed laser deposition method (eclipse angle)
Author(s): Minoru Tachiki; Eiichi Morita; Kenji Yamada; Xiaodong Fang; Takeshi Kobayashi
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In spite of the advantage of droplet reduction in the pulsed laser deposition (PLD) process, eclipse PLD method has some drawbacks that activated growth species are also shielded by the shadow mask, and deposition rate decreases in low ambient pressure condition. In this study, we proposed new composite shadow mask method named 'eclipse angel PLD method' to overcome this problem. We directly observed the emitting plume propagating through the ring-mask structure and reaching the substrate by the ultra fast camera, and confirmed growth rate enhancement of YBa2Cu3Ox thin films in low ambient oxygen pressure region. Also, did we the effects of Ar addition when are of favor to improve the film qualities of Bi-layered crystals.

Paper Details

Date Published: 20 February 1998
PDF: 5 pages
Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); doi: 10.1117/12.300700
Show Author Affiliations
Minoru Tachiki, Osaka Univ. (Japan)
Eiichi Morita, Osaka Univ. (Japan)
Kenji Yamada, Osaka Univ. (Japan)
Xiaodong Fang, Osaka Univ. (Japan)
Takeshi Kobayashi, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 3175:
Third International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?