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Proceedings Paper

Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system
Author(s): Juichi Saito; Yutaka Saijo
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Paper Abstract

The device density of integrated circuits has progressed with a 3 year cycle. The 256K DRAM was introduced in 1983 and the 4M DRAM will be in full production in 1990. The 5x stepper, which is the main lithography tool has progressed from G-line to I-line and it is said that the I-line will be able to achieve lithography for 16M DRAM's and some part of the 64 Megabit. We show the relation of this device trend compared with the required detection size of a particle and our particle detection system in TABLE 2.

Paper Details

Date Published: 1 March 1991
PDF: 18 pages
Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29758
Show Author Affiliations
Juichi Saito, Horiba Ltd. (Japan)
Yutaka Saijo, Horiba Ltd. (Japan)

Published in SPIE Proceedings Vol. 1496:
10th Annual Symp on Microlithography
James N. Wiley, Editor(s)

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