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Proceedings Paper

Numerical optimization method for semiconductor diffusion recipe programming
Author(s): Paul T. McGuire
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Paper Abstract

This paper describes the development of a standard diffusion recipe model and its use within a numerical optimization method to obtain time-optimal diffusion recipes, within nonlinear temperature-dependent constraints. The diffusion model and optimization program have been packaged as a diffusion process engineering tool, which can be applied to optimize existing diffusion recipes, thereby reducing processing time in production. Equivalence of diffusion recipes is demonstrated using commercial diffusion simulation software, on both unoptimized and optimized recipes.

Paper Details

Date Published: 25 August 1997
PDF: 9 pages
Proc. SPIE 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, (25 August 1997); doi: 10.1117/12.284629
Show Author Affiliations
Paul T. McGuire, Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 3213:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III
Abe Ghanbari; Anthony J. Toprac, Editor(s)

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